raphael
6aa4427186
A fictional Physical Vapor Deposition tool wired end-to-end.
examples/pvd_tool/ is the template a real customer should fork.
Files:
- equipment.yaml: 32 SVIDs (chamber pressure, temperature, source
power, gas flows, cooling water, wafer counters, recipe step
state, EPT name, 4 load ports), 5 DVIDs, 7 ECIDs (setpoints
+ T_CRA/T_DELAY + cleaning interval + retry count), 17 CEIDs
(control state, alarms, process lifecycle, material movement,
EPT), 12 alarms with realistic categories (safety, error,
warning, attention), 3 multi-step recipes (Al / Ti / Cu),
9 host commands.
- main.cpp (~860 lines): the vendor-side application:
§1 helpers + constants
§2 sensor simulator — 4 sensors at 10 Hz + 1 Hz cadences,
random-walk around step-targeted setpoints, asio::post-on-strand
thread-safety pattern
§3 recipe runner — parses recipe body (STEP NAME duration=120s
power=2500W gas=Argon flow=50sccm), walks each step at 1s
per declared-second, fires step-started/completed CEIDs,
drives PJ FSM through ProcessComplete
§4 alarm threshold monitor — chamber-pressure-over-setpoint and
cleaning-interval logic, continuous evaluation, set/clear
emission gated on alarm-enable
§5 EPT cycler — Standby ↔ Productive ↔ UnscheduledDowntime
based on PJ activity + safety alarms
§6 Prometheus exporter on :9090 (pvd_messages_total,
pvd_chamber_pressure_torr, pvd_spool_depth, pvd_events_total,
pvd_alarm_set_total)
§7 Router handlers — full E30 set (~40 handlers) so a host can
do real work
§8 main() — YAML validation, model construction, server wiring,
periodic gauge updates
- README.md: section-by-section walkthrough, what's the same as
apps/secs_server.cpp, what this adds (simulator + recipe runner
+ alarm monitor + EPT cycler + metrics), what's not here
(persistence + E84 + real I/O), and what to change for your tool.
Verification: 47/47 conformance harness checks PASS against the
PVD tool — same as the demo server.
CMakeLists.txt adds the pvd_tool target.
README's documentation map points at examples/pvd_tool/.
Co-Authored-By: Claude Opus 4.7 <noreply@anthropic.com>
197 lines
10 KiB
YAML
197 lines
10 KiB
YAML
# ACME-PVD-3000 — example data dictionary for a fictional Physical
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# Vapor Deposition tool. Designed to look like a real fab tool, not a
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# unit-test fixture. Read this alongside main.cpp to see how each
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# entry is wired to behaviour.
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#
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# Topology:
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# - One process chamber, single-wafer
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# - Four load ports, each accepting a 25-slot FOUP
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# - Three deposition recipes (Al / Ti / Cu)
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#
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# Real PVD tools have hundreds of SVIDs. This one ships 30 — enough
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# to demonstrate every wiring pattern (status, derived, setpoint,
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# event, alarm, recipe, host command) without burying the example.
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device:
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id: 0
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model_name: "ACME-PVD-3000"
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software_rev: "1.4.2"
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equipment_type: "PVD"
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# E30 §6.10 — what the equipment self-reports to the host on S1F19.
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# CCODE values follow E30 Appendix A.
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capabilities:
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- {code: 1, name: "Establish Communications"}
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- {code: 2, name: "Dynamic Event Report Configuration"}
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- {code: 3, name: "Variable Data Collection"}
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- {code: 5, name: "Status Data Collection"}
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- {code: 6, name: "Alarm Management"}
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- {code: 7, name: "Remote Control"}
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- {code: 8, name: "Equipment Constants"}
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- {code: 9, name: "Process Program Management"}
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- {code: 11, name: "Equipment Terminal Services"}
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- {code: 12, name: "Clock"}
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- {code: 14, name: "Spooling"}
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- {code: 15, name: "Control (operator initiated)"}
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- {code: 40, name: "E40 Process Job Management"}
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- {code: 87, name: "E87 Carrier Management"}
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- {code: 90, name: "E90 Substrate Tracking"}
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- {code: 94, name: "E94 Control Job Management"}
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- {code: 116, name: "E116 Equipment Performance Tracking"}
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- {code: 148, name: "E148 Time Synchronization"}
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- {code: 157, name: "E157 Module Process Tracking"}
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# Status variables — read-only, host queries via S1F3.
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# main.cpp updates the sensor values on a poll loop.
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svids:
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# Mandatory framework SVIDs
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- {id: 1, name: ControlState, units: "", type: ASCII, value: ""}
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- {id: 2, name: Clock, units: "", type: ASCII, value: ""}
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- {id: 3, name: EventsEnabled, units: "", type: BOOLEAN, value: true}
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# Equipment-defined
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- {id: 10, name: ProcessChamberPressureTorr, units: "Torr", type: F4, value: 1.0e-7}
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- {id: 11, name: ProcessChamberTemperatureC, units: "C", type: F4, value: 23.5}
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- {id: 12, name: LoadlockPressureTorr, units: "Torr", type: F4, value: 760.0}
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- {id: 13, name: VacuumPumpRpm, units: "rpm", type: U4, value: 0}
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- {id: 20, name: SourcePowerWatts, units: "W", type: F4, value: 0.0}
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- {id: 21, name: TargetVoltageVolts, units: "V", type: F4, value: 0.0}
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- {id: 22, name: SubstrateBiasVolts, units: "V", type: F4, value: 0.0}
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- {id: 23, name: SourceTargetMaterial, units: "", type: ASCII, value: "None"}
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- {id: 30, name: ArgonFlowSccm, units: "sccm", type: F4, value: 0.0}
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- {id: 31, name: NitrogenFlowSccm, units: "sccm", type: F4, value: 0.0}
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- {id: 32, name: CoolingWaterFlowLpm, units: "L/min", type: F4, value: 12.5}
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- {id: 40, name: ChuckTemperatureC, units: "C", type: F4, value: 24.0}
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- {id: 41, name: ShieldTemperatureC, units: "C", type: F4, value: 24.0}
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- {id: 50, name: WafersProcessedTotal, units: "wafer", type: U4, value: 0}
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- {id: 51, name: WafersProcessedSinceCleanup, units: "wafer", type: U4, value: 0}
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- {id: 52, name: ChamberHoursSinceCleanup, units: "h", type: F4, value: 0.0}
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- {id: 53, name: ActiveRecipePpid, units: "", type: ASCII, value: ""}
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- {id: 54, name: RecipeStepName, units: "", type: ASCII, value: ""}
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- {id: 55, name: RecipeStepElapsedSec, units: "s", type: U4, value: 0}
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- {id: 60, name: LoadPort1Active, units: "", type: BOOLEAN, value: false}
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- {id: 61, name: LoadPort2Active, units: "", type: BOOLEAN, value: false}
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- {id: 62, name: LoadPort3Active, units: "", type: BOOLEAN, value: false}
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- {id: 63, name: LoadPort4Active, units: "", type: BOOLEAN, value: false}
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- {id: 70, name: EptStateName, units: "", type: ASCII, value: "Standby"}
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- {id: 71, name: ProductiveHoursTotal, units: "h", type: F4, value: 0.0}
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- {id: 72, name: UnscheduledDowntimeHours, units: "h", type: F4, value: 0.0}
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# Data variables — same shape as SVIDs but conceptually "intermediate
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# data" rather than equipment status. Reported via S1F21/F22.
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dvids:
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- {id: 200, name: LastCycleTimeSec, units: "s", type: F4, value: 0.0}
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- {id: 201, name: AverageCycleTimeSec, units: "s", type: F4, value: 0.0}
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- {id: 202, name: BatchYieldPercent, units: "%", type: F4, value: 0.0}
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- {id: 203, name: LastWaferProcessedId, units: "", type: ASCII, value: ""}
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- {id: 204, name: ProcessChamberLeakRate, units: "Torr/s", type: F4, value: 1.0e-9}
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# Equipment constants — host-settable parameters. S2F15 set, S2F13 read.
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ecids:
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- {id: 100, name: ChamberBasePressureSetpoint, units: "Torr", type: F4, value: 1.0e-7, min: "1.0e-9", max: "1.0e-5"}
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- {id: 101, name: ChamberTempSetpointC, units: "C", type: F4, value: 25.0, min: "15.0", max: "40.0"}
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- {id: 102, name: SourcePowerSetpointW, units: "W", type: F4, value: 1500.0, min: "0.0", max: "5000.0"}
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- {id: 103, name: T_CRA_Seconds, units: "s", type: U4, value: 30, min: "5", max: "120"}
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- {id: 104, name: T_DELAY_Seconds, units: "s", type: U4, value: 10, min: "5", max: "60"}
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- {id: 105, name: CleaningIntervalWafers, units: "wafer", type: U4, value: 500, min: "100", max: "2000"}
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- {id: 106, name: MaxRecipeRetries, units: "", type: U4, value: 3, min: "0", max: "10"}
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# Collection events. CEID → linked report binding happens at runtime
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# via S2F33/F35/F37; the equipment fires S6F11 on transitions through
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# main.cpp's event-emit hooks.
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ceids:
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# Control / lifecycle
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- {id: 100, name: ControlStateChanged}
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- {id: 200, name: AlarmSet}
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- {id: 201, name: AlarmCleared}
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# Process lifecycle
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- {id: 300, name: ProcessStarted}
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- {id: 301, name: ProcessCompleted}
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- {id: 302, name: ProcessAborted}
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- {id: 303, name: ProcessPaused}
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- {id: 304, name: ProcessResumed}
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- {id: 310, name: RecipeStepStarted}
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- {id: 311, name: RecipeStepCompleted}
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# Material movement
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- {id: 400, name: ControlJobExecuting}
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- {id: 401, name: ControlJobCompleted}
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- {id: 410, name: CarrierLoaded}
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- {id: 411, name: CarrierUnloaded}
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- {id: 420, name: SubstrateAtSource}
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- {id: 421, name: SubstrateInProcess}
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- {id: 422, name: SubstrateProcessed}
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# Equipment performance (E116)
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- {id: 500, name: EptEnteredProductive}
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- {id: 501, name: EptEnteredStandby}
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- {id: 502, name: EptEnteredEngineering}
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- {id: 503, name: EptEnteredUnscheduledDowntime}
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# Alarms. Categories follow E5 §10.3 ALCD lower-7 bitmap:
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# 0x01 PersonalSafety 0x02 EquipmentSafety 0x04 ParameterError
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# 0x08 ParameterWarning 0x10 Irrecoverable 0x20 EquipmentStatus
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# 0x40 Attention
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alarms:
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- {id: 1, text: "Chamber pressure high (above setpoint)", category: 0x04}
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- {id: 2, text: "Chamber pressure low (below setpoint)", category: 0x04}
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- {id: 3, text: "Chamber temperature out of range", category: 0x04}
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- {id: 4, text: "Source power loss during process", category: 0x12} # safety + error
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- {id: 5, text: "Cooling water flow loss", category: 0x02} # equip safety
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- {id: 6, text: "Vacuum pump failure", category: 0x12}
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- {id: 7, text: "Door open during process", category: 0x01} # personal safety
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- {id: 8, text: "Target end-of-life", category: 0x40} # attention
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- {id: 9, text: "Recipe step timeout", category: 0x08} # warning
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- {id: 10, text: "Cleaning interval exceeded (500 wafers)", category: 0x40}
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- {id: 11, text: "Load port 1 carrier mis-clocked", category: 0x20}
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- {id: 12, text: "Substrate scanner unavailable", category: 0x20}
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# Recipes. The body is a placeholder string in this example; real
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# tools would store binary recipe bundles (E42 formatted PP) here.
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# The recipe runner in main.cpp parses the body line-by-line.
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recipes:
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- id: "AL-METALLIZATION-V3"
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body: |
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STEP PUMPDOWN duration=120s target=1.0e-7
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STEP HEAT-SUBSTRATE duration=60s target=300C
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STEP SOURCE-PREHEAT duration=30s power=500W
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STEP DEPOSIT-AL duration=180s power=2500W gas=Argon flow=50sccm
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STEP COOL duration=120s target=25C
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STEP VENT duration=60s target=760
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END
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- id: "TI-BARRIER-V2"
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body: |
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STEP PUMPDOWN duration=120s target=1.0e-7
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STEP HEAT-SUBSTRATE duration=60s target=350C
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STEP DEPOSIT-TI duration=90s power=1800W gas=Argon flow=40sccm
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STEP COOL duration=120s target=25C
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STEP VENT duration=60s target=760
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END
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- id: "CU-SEED-V1"
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body: |
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STEP PUMPDOWN duration=120s target=1.0e-7
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STEP HEAT-SUBSTRATE duration=60s target=250C
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STEP DEPOSIT-CU duration=240s power=3000W gas=Argon flow=60sccm
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STEP COOL duration=120s target=25C
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STEP VENT duration=60s target=760
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END
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# Host commands. `emit_ceid` fires the named CEID after dispatch;
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# `set_alarm` sets an alarm. `force_spool` is the demo-only test hook.
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host_commands:
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- {name: START, ack: Accept, emit_ceid: 300}
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- {name: STOP, ack: Accept, emit_ceid: 301}
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- {name: PAUSE, ack: Accept, emit_ceid: 303}
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- {name: RESUME, ack: Accept, emit_ceid: 304}
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- {name: ABORT, ack: Accept, emit_ceid: 302}
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- {name: CLEAN_CHAMBER, ack: Accept}
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- {name: FAULT, ack: Accept, set_alarm: 4} # injected fault for demo
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- {name: SPOOL_ON, ack: Accept, force_spool: true}
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- {name: SPOOL_OFF, ack: Accept, force_spool: false}
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# Spool (E30 §6.22) — when the host disconnects, queue these streams
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# for later drain via S6F23.
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spool:
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max_size: 1000
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spoolable_streams: [5, 6]
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# Auto-fire CEID 100 on every control-state change.
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emit_on_control_change: 100
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