secs-gem/docs/16_e90_e157_substrates_modules.md

16 — E90 + E157: Substrate and module tracking

← 15 E87 — Carriers and load ports | Back to index | Next: 17 E116 + E120 + E39 — Performance, CEM, objects →

E87 (chapter 15) tracks the container. E90 and E157 track what's inside the container — every individual wafer (substrate) and every process module the wafer passes through.

This chapter is shorter than the others in Part 2 because the ideas overlap E87 (the same three-orthogonal-axes pattern repeats) and E40 (state events drive S6F11 CEIDs).

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E90 — Substrate tracking

What it tracks

One state-bearing record per wafer, identified by a substrate ID (an ASCII string, often the laser-etched serial number).

E90 has three orthogonal axes — the same pattern as E87's carrier (chapter 15 §3):

1. Substrate State (STS) — location

// include/secsgem/gem/substrate_state.hpp:26
enum class SubstrateState : uint8_t {
  AtSource         = 0,    // in its origin carrier slot
  AtWork           = 1,    // in-process at a module
  AtDestination    = 2,    // delivered to final location
  NoState          = 255,
};

Events: Acquire (Source→Work), Release (Work→Destination), Return (Work→Source, for unprocessed return).

2. Substrate Processing State (SPS) — lifecycle

enum class SubstrateProcessingState : uint8_t {
  NeedsProcessing = 0,
  InProcess       = 1,
  Processed       = 2,
  Aborted         = 3,
  Stopped         = 4,
  Rejected        = 5,
  Lost            = 6,
  Skipped         = 7,
  NoState         = 255,
};

Events: StartProcessing, EndProcessing, Abort, Stop, Reject, ReportLost, Skip.

3. Substrate ID Status — identity confidence

enum class SubstrateIDStatus : uint8_t {
  NotConfirmed   = 0,
  WaitingForHost = 1,
  Confirmed      = 2,
  Mismatched     = 3,
  NoState        = 255,
};

Mirrors the CarrierIDStatus pattern from E87 — same problem (equipment reads ID, host may need to verify), same shape of solution.

Why three axes?

The same reason E87 has three: these aspects evolve at different times and for different reasons.

• A wafer can be AtWork + NeedsProcessing (just arrived, recipe hasn't started).
• A wafer can be AtWork + InProcess (recipe running).
• A wafer can be AtSource + Processed + Confirmed (back in its carrier slot after processing — typical end state).

Putting all three in one enum would multiply to ~30 valid combinations. Three independent FSMs with ~3 events each is much cleaner.

Code

State machines: include/secsgem/gem/substrate_state.hpp defines SubstrateStateMachine, which composes the three.

Store: include/secsgem/gem/store/substrates.hpp holds one record per substrate ID, with a Location string the application updates as the wafer moves.

Tests: tests/test_substrates.cpp (14 cases — every axis, every event); persistence in tests/test_substrate_persistence.cpp (7 cases).

CEID-on-wire emission ("Substrate StartProcessing fires the configured SubstrateInProcess CEID") is verified by tests/test_wire_ceid_emission.cpp.

Wire interaction

E90 doesn't define its own S/F messages — substrate state changes fire as CEIDs that the host has subscribed to via the standard E30 §6.6 Dynamic Event Report Configuration (chapter 13). So:

• Equipment fires Acquire event on substrate W-2026-06-09-A47.
• SubstrateStateMachine transitions Source → Work.
• The state-change handler looks up the configured CEID for "SubstrateInProcess" (from data/equipment.yaml).
• That CEID fires → compose_reports_for(ceid) → S6F11.

Host gets one S6F11 per wafer transition. In a 25-wafer FOUP that's 25–50 events per processing pass. Persistent reports + spool (chapter 13 Additionals) handle the burst.

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E157 — Module Process Tracking

What it tracks

One state-bearing record per process module. A cluster tool has multiple modules (Chamber A, Chamber B, Pre-clean, …); each runs its own recipe step in parallel or sequence. E157 lets the host see which module is in which step of which recipe right now.

The states

// include/secsgem/gem/module_state.hpp:20
enum class ModuleState : uint8_t {
  NotExecuting     = 0,
  GeneralExecuting = 1,   // setup, pre-process, post-process
  StepExecuting    = 2,   // actively running a recipe step
  StepCompleted    = 3,
  NoState          = 255,
};

Events: StartGeneral, StartStep, CompleteStep, Reset, Abort.

Notice this is a much simpler FSM than E90 — one axis only. That's because modules are more deterministic than substrates: a module is either running a step or it isn't; substrates can be in many overlapping conditions.

Code

include/secsgem/gem/module_state.hpp defines ModuleStateMachine.

Store: include/secsgem/gem/store/modules.hpp.

Tests: tests/test_modules.cpp (5 cases).

How E157 plays with E40 and E90

Concrete example. A PVD tool with three modules (Chamber A, B, C); host submits PJ for wafer W-1, recipe says "process at Chamber B for 90 seconds":

1. PJ-1 transitions Queued → SettingUp → WaitingForStart → Processing.
   (E40 FSM, chapter 14)
2. Equipment fires ModuleEvent::StartGeneral on Chamber B.
   ModuleState: NotExecuting → GeneralExecuting.
   (E157 FSM)
3. Equipment fires SubstrateEvent::Acquire on W-1.
   Substrate STS: AtSource → AtWork.
   (E90 FSM)
4. Recipe step begins.  ModuleEvent::StartStep on Chamber B.
   ModuleState: GeneralExecuting → StepExecuting.
   Substrate SPS: NeedsProcessing → InProcess.
5. ...90 seconds pass...
6. Recipe step ends.  ModuleEvent::CompleteStep on Chamber B.
   ModuleState: StepExecuting → StepCompleted.
   Substrate SPS: InProcess → Processed.
7. Substrate released.  SubstrateEvent::Release on W-1.
   Substrate STS: AtWork → AtDestination.
8. PJ-1: ProcessComplete.

Each of the eight transitions fires a CEID, which fires an S6F11 event report. The host sees the complete trace of where every wafer was at every moment.

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Where to go next

You now know how every component of in-flight material is tracked. The next chapter covers the three smaller GEM 300 standards that round out the suite: equipment performance time tracking, the common equipment model, and generic object services.

Next: → 17 E116 + E120 + E39 — Performance, CEM, objects